• Photografting of Polystyrene : I. Preparation and Photografting Reaction of Poly(styrene-co-BMVB)
  • Chae KH, Yoon CH, Ham HS
  • 폴리스티렌의 광그라프트 반응 : I. Poly(Styrene-co-BMVB)공중합체의 합성 및 광그라프트 반응
  • 채규호, 윤찬호, 함희석
Abstract
The photosensitive copolymer, poly(styrene-co-BMVB) was prepared by copolymerization of styrene with butanedionemonoxime vinylbenzoate (BMVB) which has photosensitive oxime ester groups. In order to get a hydrophilically modified polystyrene, hydroxyethyl methacrylate (HEMA) or methacrylic acid (MAA) was photografted onto the copolymer. The photografting yield of the copolymer increased with increasing the amount of irradiation time, monomer concentration, and the relative ratio of BMVB over the styrene unit in the copolymer. The photografting yields of the copolymers with HEMA are slightly higher than those of MAA.

폴리스티렌의 소수성의 성질을 친수성으로 개질시키기 위하여 빛에 민감한 옥심 에스테르기를 가진 단량체인 butanedionemonoxime vinylbenzoate (BMVB)와 스티렌과의 공중합체를 합성 한다음 2-hydroxyethyl methacrylate (HEMA) 또는 methacrylic acrid (MAA)를 광그라프트 시켰다 이 공중합체에 대한 광그라프트율은 공중합체 내의 스티렌에 대한 BMVB의 상대적인 비, 빛조사 시간, 그리고 단량체의 농도가 증가할수록 증가하였다. 공중합체의 HEMA에 대한 광그라 프트율은 MAA의 경루 보다 약간 높게 나타났다.

Keywords: photosensitive polymer; phtogratfting; modified polystyrene; oxime esters

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  • Polymer(Korea) 폴리머
  • Frequency : Bimonthly(odd)
    ISSN 0379-153X(Print)
    ISSN 2234-8077(Online)
    Abbr. Polym. Korea
  • 2024 Impact Factor : 0.6
  • Indexed in SCIE

This Article

  • 1996; 20(1): 17-24

    Published online Jan 25, 1996